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Description:
These products produced by our institute,which possess superior grinding performance and high cost performance,are among the top level worldwide.
Application: back thinning, grinding and fine grinding of apphire epitaxial wafer, silicon wafer, gallium arsenide and GaN wafer.
Applicable Grinding Machine:
The back grinding wheels can be used for the Japanese ,German, American, Korean and other grinders . Such as Okamoto , Disco, Strasbaugh and others grinding machine
Advantages:
1.surface quality: require grinding lines evenly, without chipping, debris, scribe, etc.;
2.processing accuracy: TTV <5 um etc. (Total thinning veracity)
3.Processing quality:surface roughness: < 10 nm; damage layer thickness: < 10 um
Drawing & Specification:
Model |
D (mm) |
T (mm) |
H (mm) |
6A2/6A2H |
175 |
30, 35 |
76 |
200 |
35 |
76 |
|
350 |
45 |
127 |
|
6A2T |
195 |
22.5, 25 |
170 |
280 |
30 |
228.6 |
|
6A2T(three ellipses) |
350 |
35 |
235 |
209 |
22.5 |
158 |
|
Other specifications can be produced according to customers' requirement. |